Application of Deposition Phase Diagrams for the Optimization of a-Si:H-Based Materials and Solar Cells

Materials Research Society Symposium - Proceedings

Volumn 762, Issue , 2003, Pages 443-454

  Collins, R W ^a   Ferlauto, A S ^a   Ferreira, G M ^a   Koh, Joohyun ^a   Chen, Chi ^a   Koval, R J ^a   Pearce, J M ^a   Wronski, C R ^a   Al Jassim, M M ^b   Jones, K M ^b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; COALESCENCE; DEPOSITION; ELECTRONIC PROPERTIES; ELLIPSOMETRY; FILM GROWTH; HYDROGENATION; LOW TEMPERATURE EFFECTS; NUCLEATION; PHASE DIAGRAMS; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SILICON WAFERS;

REAL TIME SPECTROSCOPIC ELLIPSOMETRY (RTSE); ROUGHENING TRANSITION;

SOLAR CELLS;

EID: 1642479947     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (25)

1. Y. Lu, S. Kim, M. Gunes, Y. Lee, C. R. Wronski, and R. W. Collins, Mater. Res. Soc. Symp. Proc. 336 (1994) 595.
2. D. V. Tsu, B. S. Chao, S. R. Ovshinsky, S. Guha, and J. Yang, Appl. Phys. Lett. 71 (1997) 1317.
3. J. Koh, Y. Lee, H. Fujiwara, C. R. Wronski, and R. W. Collins, Appl. Phys. Lett. 73 (1998) 1526.
4. J. Koh, A. S. Ferlauto, P. I. Rovira, C. R. Wronski, and R. W. Collins, Appl. Phys. Lett. 75 (1999) 2286.
5. J. Yang, K. Lord, S. Guha, and S. R. Ovshinsky, Mater. Res. Soc. Symp. Proc. 609 (2001) A15.4.1.
6. D. V. Tsu, B. S. Chao, S. R. Ovshinsky, S. J. Jones, J. Yang, S. Guha, and R. Tsu, Phys. Rev. B 63 (2001) 125338-1.
7. O. Vetterl, F. Finger, R. Carius, P. Hapke, L. Houben, O. Kluth, A. Lambertz, A. Muck, B. Rech, and H. Wagner, Sol. Energy Mater. Sol. Cells 62 (2000) 97.
8. O. Vetterl, R. Carius, L. Houben, C. Scholten, M. Luysberg, A. Lambertz, F. Finger, and H. Wagner, Mater. Res. Soc. Symp. Proc. 609 (2000) A15.2.1.
9. A. S. Ferlauto, P. I. Rovira, R. J. Koval, C. R. Wronski, and R. W. Collins, Mater. Res. Soc. Symp. Proc. 609 (2000) A2.2.1.
10. A. S. Ferlauto, R. J. Koval, C. R. Wronski, and R. W. Collins, Appl. Phys. Lett. 80 (2002) 2666.
11. C. R. Wronski, J. M. Pearce, R. J. Koval, X. Niu, A. S. Ferlauto, J. Koh, and R. W. Collins, Mater. Res. Soc. Symp. Proc. 715 (2002) A13.4.1.
12. R. J. Koval, J. Koh, Z. Lu, L. Jiao, R. W. Collins, and C. R. Wronski, Appl. Phys. Lett. 75 (1999) 1553.
13. J. M. Pearce, R. J. Koval, A. S. Ferlauto, R. W. Collins, C. R. Wronski, J. Yang, and S. Guha, Appl. Phys. Lett. 77 (2000) 3093.
14. R. W. Collins in: H. Fritzsche, ed., Amorphous Silicon and Related Materials Vol. 1B (World Scientific, Singapore, 1988) 1003.
15. Y. Li, I. An, H. V. Nguyen, C. R. Wronski, and R. W. Collins, Phys. Rev. Lett. 68 (1992) 2814.
16. A. S. Ferlauto, G. M. Ferreira, R. J. Koval, J. M. Pearce, C. R. Wronski, and R. W. Collins, these Proceedings.
17. W. M. Tong and R. S. Williams, Annu. Rev. Phys. Chem. 45 (1994) 401.
18. B. J. Palmer and R. G. Gordon, Thin Solid Films 158 (1988) 313.
19. A. Mazor, D. J. Srolovitz, P. S. Hagan, and B. G. Bukiet, Phys. Rev. Lett. 60 (1988) 424.
20. R. W. Collins and B.-Y. Yang, J. Vac. Sci. Technol. B 7 (1989) 1155.
21. For a recent review, see: A. Matsuda, J. Vac. Sci. Technol. A 16 (1998) 365.
22. J. Robertson, J. Appl. Phys. 87 (2000) 2608.
23. S. Kim and R. W. Collins, Appl. Phys. Lett. 67 (1995) 3010.
24. H. Fujiwara, J. Koh, C. R. Wronski, R. W. Collins, and J. S. Burnham, Appl. Phys. Lett. 72 (1998) 2993.
25. A. S. Ferlauto, J. Koh, P. I. Rovira, C. R. Wronski, R. W. Collins, and G. Ganguly, J. Non-Cryst. Solids 266-269 (2000) 269.