Fabrication of double quantum dots by combining afm and e-beam lithography

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 21, Issue 2-4, 2004, Pages 483-486

  Rogge, M C ^a   Fuhner C ^a   Keyser, U F ^a   Bichler, M ^b   Abstreiter, G ^b   Wegscheider, W ^c   Haug, R J ^a  

^a LEIBNIZ UNIVERSITY HANNOVER   (Germany)

^b WALTER SCHOTTKY INSTITUT   (Germany)

^c UNIVERSITY OF REGENSBURG   (Germany)

Author keywords

Atomic force microscope; Coupled quantum dots; Electron beam lithography; Local anodic oxidation

Indexed keywords

ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; ELECTRIC CONDUCTANCE; ELECTRIC POTENTIAL; ELECTRON BEAM LITHOGRAPHY; NANOTECHNOLOGY; OPTICAL RESOLVING POWER; QUANTUM THEORY; SCANNING;

COUPLED QUANTUM DOTS; LOCAL ANODIC OXIDATION (LAO);

SEMICONDUCTOR QUANTUM DOTS;

EID: 1642335137     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2003.11.054     Document Type: Conference Paper

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