The electronic structures of the thin films of InVO4 and TiO2 by first principles calculations

Thin Solid Films

Volumn 445, Issue 2, 2003, Pages 168-174

  Oshikiri, M ^a   Boero, M ^b   Ye, J ^a   Aryasetiawan, F ^c   Kido, G ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b UNIVERSITY OF TSUKUBA   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

First principles; InVO4; Photo catalyst; Surface

Indexed keywords

CATALYST ACTIVITY; CHEMICAL BONDS; COMPUTER SIMULATION; CRYSTAL STRUCTURE; DENSITY OF GASES; ELECTRONIC STRUCTURE; MATHEMATICAL MODELS; MICROSCOPIC EXAMINATION; PHOTOCATALYSIS; PHOTOEMISSION; TITANIUM OXIDES; VANADIUM COMPOUNDS;

FIRST PRINCIPLES CALCULATIONS; INVO4;

THIN FILMS;

EID: 1642333809     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.08.054     Document Type: Conference Paper

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