Density and concentration fluctuations in F-doped SiO2 glass

Journal of Applied Physics

Volumn 95, Issue 5, 2004, Pages 2432-2435

  Watanabe, T ^a   Saito, K ^a   Ikushima, A J ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CORRELATION METHODS; DENSITY (SPECIFIC GRAVITY); DOPING (ADDITIVES); ERROR ANALYSIS; FLUORINE; FREE ENERGY; INFRARED SPECTROPHOTOMETERS; PHONONS; RELAXATION PROCESSES; SURFACE STRUCTURE; THERMAL EFFECTS; X RAY SCATTERING;

GLASS STRUCTURES; SMALL ANGLE X-RAY SCATTERING (SAXS); SURFACE RELAXATION;

FUSED SILICA;

EID: 1642309627     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1645641     Document Type: Article

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