Mechanism of ArF resist-pattern shrinkage in critical-dimension scanning electron microscopy measurement

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 1, 2004, Pages 226-230

  Azuma, Tsukasa ^a,b   Chiba, Kenji ^a   Abe, Hideaki ^a   Motoki, Hiroshi ^a   Sasaki, Noriaki ^a  

^a TOSHIBA CORPORATION   (Japan)

^b Advanced SoC Platform Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CURING; DECOMPOSITION; DEGASSING; DISSOLUTION; ELECTRON BEAMS; ELECTRON SCATTERING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN BONDS; MONTE CARLO METHODS; OLEFINS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SHRINKAGE;

CRITICAL-DIMENSION ELECTRON MICROSCOPY (CD-SEM); ELECTRON BEAM TRAJECTORIES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 1642304484     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1643055     Document Type: Conference Paper

References (9)

1. L. Pain, N. Monti, N. Martin, V. Tirard, A. Gandolfi, M. Bollin, and M. Vasconi, Proc. Interface '00, 233 (2000).
2. M. Vasconi, M. Bollin, G. Cotti, L. Pain, and V. Tirard, Proc. SPIE 4344, 653 (2001).
3. T. Kudo, J. B. Bae, R. Dammel, W. K. Kim, and D. McKenzie, Proc. SPIE 4345, 179 (2001).
4. C. M. Ke, A. Yen, J. Yee, M. Chu, S. Fu, E. Huang, and D. Yeh, Proc. SPIE 4690, 598 (2002).
5. P. Martens, S. Yamamoto, K. Edomatsu, Y. Uetani, L. Pain, R. Palla, M. Ross, and W. Livesay, Proc. SPIE 4345, 138 (2001).
6. M. S. Kim, J. W. Park, H. J. Kim, B. J. Jun, M. G. Gil, B. H. Kim, M. Ross, and W. Livesay, Proc. SPIE 4345, 737 (2001).
7. M. Padmanaban, E. Alemy, R. Dammel, W. K. Kim, T. Kudo, S. H. Lee, D. McKenzie, A. Orsi, D. Rahman, W. L. Chen, R. M. Sadjadi, W. Livesay, and M. Ross, Proc. SPIE 4690, 606 (2002).
8. C. J. Wu, W. Huang, K. R. Chen, C. N. Archie, and M. E. Lagus, Proc. SPIE 4345, 190 (2001).
9. A. Habermas, D. Hong, M. Ross, and W. Livesay, Proc. SPIE 4689, 92 (2002).