A Unified Framework for Digital Halftoning and Dither Mask Construction: Variations on a Theme and Implementation Issues

International Conference on Digital Printing Technologies

Volumn , Issue , 2003, Pages 793-796

  Wu, Chai Wah ^a   Thompson, Gerhard ^a   Stanich, Mikel ^b  

^a IBM RESEARCH   (United States)

^b IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; FAST FOURIER TRANSFORMS; IMAGE ANALYSIS; MASKS; OPTIMIZATION; PRINTING;

DIGITAL HALFTONING;

PRINTERS (COMPUTER);

EID: 1642287682     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

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2. C. W. Wu, C. P. Tresser, G. R. Thompson, and M. J. Stanich, "Supercell dither masks with constrained blue noise interpolation," Proc. IS&T's NIP17: Int. Conf. on Digital Printing Tech., pp. 487-490, 2001.
3. R. Näsänen, "Visibility of halftone dot textures," IEEE Jr. Syst. Man, Cyb., vol. 14, no. 6, pp. 920-924, 1984.
4. J. Sullivan, L. Ray, and R. Miller, "Design of minimum visual modulation halftone patterns," IEEE Tr. Syst. Man, Cyb., vol. 21, no. 1, pp. 33-38, 1991.
5. R. Ulichney, "The void-and-cluster method for dither array generation," Proc. of SPIE, vol. 1913, pp. 332-343, 1993.
6. M. Yao and K. J. Parker, "Modified approach to the construction of the blue noise mask," J. of Electronic Imaging, vol. 3, no. 1, pp. 92-97, 1994.
7. D. J. Lieberman and J. P. Allebach, "On the relation between DBS and Void and Cluster," IS&T's NIP 14: Int. Conf. on Dig. Print. Tech., pp. 290-293, 1998.
8. J. P. Allebach, "DBS: retrospective and future directions," Proc. of SPIE, vol. 4300, pp. 358-376, 2001.
9. G. R. Thompson, C. P. Tresser and C. W. Wu, US Patents 5,917,951 and 6,025,930.