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Volumn 19, Issue 3, 2004, Pages 373-379

Numerical modelling and simulation of non-uniformly doped channel 6H-silicon carbide MOSFET

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE-SHEET APPROACH; CURRENT TRANSPORT; DOPANT IMPURITIES; DRAIN CURRENT; FERMI-DIRAC STATISTICS; QUASI-FERMI LEVEL; SURFACE POTENTIAL;

EID: 1642269053     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/19/3/013     Document Type: Article
Times cited : (9)

References (22)
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  • 3
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    • Characterization of interface traps in the subthreshold region of implanted 4H and 6H-SiC MOSFET's
    • Zeng Y, Softie A and White M H 2002 Characterization of interface traps in the subthreshold region of implanted 4H and 6H-SiC MOSFET's Solid State Electron. 46 1579-82
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    • Zeng, Y.1    Softie, A.2    White, M.H.3
  • 5
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    • Itoh A, Kimoto A and Matsunami H 1996 Excellent reverse blocking characteristics of high-voltage 4H-SiC schottky rectifiers with boron-implanted edge termination IEEE Trans. Electron Devices. 17 139-41
    • (1996) IEEE Trans. Electron Devices , vol.17 , pp. 139-141
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  • 7
    • 0033098345 scopus 로고    scopus 로고
    • Recent progress of submicron CMOS using 6H-SiC for smart power applications
    • Lam M P and Kornegay K T 1999 Recent progress of submicron CMOS using 6H-SiC for smart power applications IEEE Trans. Electron Devices 46 546-54
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  • 11
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    • Arnold E 1999 Charge sheet model for silicon carbide inversion layers IEEE Trans. Electron Devices 46 497-503
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    • Arnold, E.1
  • 13
    • 0027558366 scopus 로고
    • Comparison of 6H-SiC, 3C-SiC and Si for power devices
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    • Bhatnagar, M.1    Baliga, B.J.2
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    • Dryfuse M W and Tabib-Azar M 1996 A relationship between interface trap density and transconductance in 6H-SiC enhancement model field effect transistors Solid State Electron. 9 1331-1335
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.