Atomic diffusion and phase equilibria at the interfaces of the CoAl/Ir multilayer on Nb 5 Si 3 -base alloys

Metallurgical and Materials Transactions A: Physical Metallurgy and Materials Science

Volumn 36, Issue 3, 2005, Pages 591-599

  Kimura, Yoshisato ^a   Shimizu, Tatsuya ^a   Shina, Sachiyori ^a,b   Mishima, Yoshinao ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM ALLOYS; ANNEALING; DIFFUSION IN SOLIDS; HOT PRESSING; INTERFACES (MATERIALS); INTERMETALLICS; IRIDIUM ALLOYS; OXIDATION RESISTANCE; PHASE EQUILIBRIA; SILICON ALLOYS; SOLID SOLUTIONS; SOLUBILITY;

ATOMIC DIFFUSION; BOLTZMANN-MATANO ANALYSIS; INTERMETALLIC PHASES;

NIOBIUM ALLOYS;

EID: 16344366077     PISSN: 10735623     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11661-005-0174-4     Document Type: Article

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