Photochemical etching of metals

Metal Finishing

Volumn 98, Issue 6, 2000, Pages 414-417

  Abate, Kenneth ^a  

^a BMC Industries   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 15844418900     PISSN: 00260576     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-0576(00)80439-0     Document Type: Article

References (6)

1. Jorgensen, G.W. and M.H. Bruno, "The Sensitivity of Bichromated Coatings," Lithographic Tech. Foundation. New York; Bulletin, 218:1; 1954
2. Baynes, J., U.S. Patent 378,423; 1888
3. DeForest, W.S., Photoresist, Materials and Processes, McGraw-Hill Book Co., New York; 1975
4. Allen, D.M., The Principles and Practices of Photochemical Machining and Photoetching, Adam Hilger, IOP Publishing Ltd., Bristol, England; 1986
5. Thompson, L.F. et al., Introduction to Microlithography, 2nd edition, American Chemical Society, Washington; 1994
6. Allen, D.M., The Principles and Practices of Photochemical Machining and Photoetching, Adam Hilger, IOP Publishing Ltd., Bristol, England; 1986, pp. 80-82