Thermoelectric properties of boron-carbide thin film and thin film based thermoelectric device fabricated by intense-pulsed ion beam evaporation

Science and Technology of Advanced Materials

Volumn 6, Issue 2, 2005, Pages 181-184

  Sasaki, Syunsuke ^a   Takeda, Masatoshi ^a   Yokoyama, Keisuke ^a   Miura, Takahiro ^a   Suzuki, Tsuneo ^a   Suematsu, Hisayuki ^a   Jiang, Weihua ^a   Yatsui, Kiyoshi ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Boron carbide; Hexaboride; Intense pulsed ion beam evaporation; Pulsed laser deposition; Thermoelectric device; Thermoelectric material

Indexed keywords

BORON CARBIDE; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; EVAPORATION; ION BEAMS; PULSED LASER DEPOSITION; THERMOELECTRIC EQUIPMENT; THERMOELECTRICITY;

HEXABORIDE; INTENSE PULSED-ION BEAM EVAPORATION; THERMOELECTRIC DEVICES; THERMOELECTRICAL MATERIALS;

THIN FILMS;

EID: 15844402013     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.stam.2004.11.010     Document Type: Article

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