Growth of ZnO films by MOCVD in high magnetic field

Journal of Crystal Growth

Volumn 275, Issue 1-2, 2005, Pages

  Kasuga, M ^a   Takano, T ^a   Akiyama, S ^a   Hiroshima, K ^a   Yano, K ^a   Kishio, K ^b  

^a UNIVERSITY OF YAMANASHI   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

A1. Magnetic fields; A1. X ray diffraction; A2. Metalorganic chemical vapor deposition; B1. Oxides; B1. Zinc compounds; B2. Semiconducting II VI materials

Indexed keywords

MAGNETIC FIELDS; MATHEMATICAL MODELS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR MATERIALS; THIN FILMS; VAPORS; X RAY DIFFRACTION; ZINC COMPOUNDS;

LEAFLET-LIKE STRUCTURES; LORENTZ FORCE; SEMICONDUCTING II-VI MATERIALS; ZINC OXIDE FILMS;

ZINC OXIDE;

EID: 15844381915     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.11.189     Document Type: Conference Paper

References (2)

1. Y. Ma, K. Watanabe, S. Awaji, and M. Motokawa Appl. Phys. Lett. 77 2000 3633
2. Naohisa Ogawa, private communication.