Evidence of refractive index change in glass substrates induced by high-density reactive ion plating deposition of SiO 2 films

Applied Surface Science

Volumn 244, Issue 1-4, 2005, Pages 51-54

  Mistrik, Jan ^a   Ohlidal, Ivan ^a   Antos, Roman ^a   Aoyama, Mitsuru ^a   Yamaguchi, Tomuo ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Change of refractive index; Ellipsometry; Ion plating; Plasma assisted deposition; Reflectometry; Schott B270; SiO 2 glass interface

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL MODIFICATION; ELLIPSOMETRY; INTERFACES (MATERIALS); NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; PLATING; REFLECTOMETERS; REFRACTIVE INDEX; SILICA; THIN FILMS; TRANSPARENCY; X RAY DIFFRACTION;

CHANGE OF REFRACTIVE INDEX; HIGH-DENSITY REACTIVE ION PLATING (HDRIP); ION PLATING; PLASMA-ASSISTED DEPOSITION; REFLECTOMETRY; SCHOTT B270; SIO2/GLASS INTERFACE; SPECTROSCOPIC ELLIPSOMETRY;

GLASS;

EID: 15844372313     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.09.128     Document Type: Conference Paper

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