In situ X-ray diffraction study of crystallization process of GeSbTe thin films during heat treatment

Applied Surface Science

Volumn 244, Issue 1-4, 2005, Pages 281-284

  Kato, Naohiko ^a   Konomi, Ichiro ^a   Seno, Yoshiki ^a   Motohiro, Tomoyoshi ^a  

^a Rd Management Section   (Japan)

Author keywords

Amorphous; Crystallization; GeSbTe thin film; Phase change; Synchrotron radiation; X ray diffraction

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS FILMS; CRYSTALLIZATION; DIFFERENTIAL SCANNING CALORIMETRY; GERMANIUM COMPOUNDS; HEAT TREATMENT; LIGHT REFLECTION; PHASE TRANSITIONS; SYNCHROTRON RADIATION; X RAY DIFFRACTION;

AMORPHOUS; GESBTE THIN FILM; OPTICAL CONSTANTS; PHASE-CHANGE;

THIN FILMS;

EID: 15844370906     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.10.145     Document Type: Conference Paper

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