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Volumn 48, Issue 3, 2005, Pages 27-32
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Physics and process drive etch performance at 45nm
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRON ENERGY DISTRIBUTION;
ION ENERGY;
LOW-BIAS PLASMA;
PATTERN TRANSFER;
PLASMA PHYSICS;
ASPECT RATIO;
CHEMICAL REACTORS;
ELECTRON ENERGY LEVELS;
GAIN CONTROL;
ION BOMBARDMENT;
LOW TEMPERATURE EFFECTS;
PLASMA DENSITY;
PRESSURE EFFECTS;
SILICA;
SURFACE ROUGHNESS;
TUNING;
PLASMA ETCHING;
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EID: 15844369407
PISSN: 0038111X
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Review |
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Times cited : (2)
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References (0)
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