Eosin Sensitized Photopolymerization of N,N'-Methylenebisacrylamide in the Presence of Allyl Thiourea: A Kinetic Study

Journal of Polymer Materials

Volumn 13, Issue 2, 1996, Pages 121-125

  Suresh Babu, B ^a   Bhagavanthu, ^a   Nageswar Rao, K ^a   Sethuram, ^a  

^a OSMANIA UNIVERSITY   (India)

Author keywords

Allyl thiourea; Cyclization; Eosin; Photopolymerization; Semireduced dye

Indexed keywords

EID: 1542787589     PISSN: 09738622     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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