Study of the influence of nonuniform pupils in photolithographic systems through the Apparent Transfer Function

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2774, Issue , 1996, Pages 369-377

  Yzuel, M J ^a   Hild, R ^b   Campos, J ^a   Escalera, J C ^a  

^a UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Apodization; Apparent Transfer Function; Depth of Focus; Photolithography

Indexed keywords

LIGHT POLARIZATION; PHOTOLITHOGRAPHY; TRANSMISSIONS;

APODIZATIONS; DEFOCUS; DEPTH OF FOCUS; PARTIALLY COHERENT ILLUMINATION; SPATIAL FREQUENCY; TRANSMISSION FILTERS;

TRANSFER FUNCTIONS;

EID: 1542544719     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.246680     Document Type: Conference Paper

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