Microstructuring of glassy carbon: Comparison of laser machining and reactive ion etching

Thin Solid Films

Volumn 453-454, Issue , 2004, Pages 36-41

  Kuhnke, M ^a   Lippert, Th ^a   Ortelli, E ^b   Scherer, G G ^a   Wokaun, A ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b Dyconex Ltd   (Switzerland)

Author keywords

Glassy carbon; Laser ablation; Metal film; Micro fuel cell; Reactive ion etching

Indexed keywords

ELECTRIC POTENTIAL; ELECTROCHEMICAL ELECTRODES; ION BOMBARDMENT; LASER ABLATION; MASKS; NEODYMIUM LASERS; PULSED LASER APPLICATIONS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

GLASSY CARBON (GC); LASER MACHINING;

METALLIC FILMS;

EID: 1542531301     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.156     Document Type: Conference Paper

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