Preparation of Silica Thin Films by Reduction of Aqueous Solution

Electrochemical and Solid-State Letters

Volumn 7, Issue 3, 2004, Pages

  Chigane, Masaya ^a   Izaki, Masanobu ^a   Shinagawa, Tsutomu ^a   Ishikawa, Masami ^a  

^a OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ATOMIC FORCE MICROSCOPY; CATALYSTS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; FLUORESCENCE; INFRARED SPECTROSCOPY; PH; POLYETHYLENE TEREPHTHALATES; REDUCTION; SILICON WAFERS; SOL-GELS; SOLUTIONS; SPUTTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CATALYTIC SUBSTRATES; REACTIVE SPUTTERING;

SILICA;

EID: 1542502045     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1643037     Document Type: Article

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