|
|
|
Volumn 47, Issue 2, 2004, Pages 45-46
|
|
Today's binary and EAPSMs need advanced: Mask cleaning methods
a
a
Akrion
(United States)
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
EMBEDDED ATTENUATED PHASE-SHIFT MASKS (EAPSM);
MEGASONIC TECHNOLOGY;
WET CLEANING;
ALKALINITY;
CHROMIUM COMPOUNDS;
CLEANING;
DRY ETCHING;
IRRADIATION;
LASERS;
LITHOGRAPHY;
OPACITY;
OZONE;
PHASE SHIFT;
ULTRAVIOLET RADIATION;
MASKS;
|
|
EID: 1542469164
PISSN: 0038111X
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Review |
|
Times cited : (6)
|
|
References (0)
|
