Regulating of bias voltage of a r.f.-powered glow discharge excitation source and the emission characteristics

Bunseki Kagaku

Volumn 48, Issue 1, 1999, Pages 95-101

  Wagatsuma, Kazuaki ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Bias voltage control; Detection limit; Emission intensity; Optical emission spectrometry; R.f. powered glow discharge plasma; Self bias voltage

Indexed keywords

EID: 1542421241     PISSN: 05251931     EISSN: None     Source Type: Journal    
DOI: 10.2116/bunsekikagaku.48.95     Document Type: Article

References (12)

1. D C. Duckworth, R.K. Marcus: Anal. Chem., 61, 1879 (1989).
2. R. Payling, D. G. Jones, S. A. Gower: Surf. interface Anal., 20, 959 (1993).
3. D. G. Jones, R. Payling, S. A. Gower, E. M. Boge: J. Anal. At. Spectrum., 9, 369 (1994).
4. K. Wagatsuma, S. Suzuki: Fresenius' J. Anal. Chem., 358, 581 (1997).
5. B. Chapman: "Glow Discharge Processes", (1980), (John Wiley & Sons, New York).
6. M. R. Winchester, C. Lazik, R. K Marcus: Spectrochim. Acta, 46B, 483 (1991).
7. W.Grimm: Spectrochim. Acta, 23B, 443 (1968).
8. K. Wagatsuma, K. Hirokawa.: Surf. Interface Anal., 6, 167 (1984).
9. K. Wagatsuma, K. Hirokawa: Anal. Chem., 56, 1112 (1984).
10. K. Wagatsuma, K. Hirokawa: Spectrochim. Acta, 50B, 109 (1995).
11. P. W. J. M. Boumans: "Inductively Coupled Plasma Emission Spectroscopy Part 1", Chap. 4 (1987), (John Wiley & Sons, New York).