Probeless voltage contrast using a focused ion beam for opens and shorts defect isolation of ultralarge scale integration technologies

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 4, 1997, Pages 916-920

  Giewont, Kenneth J ^a   Hunt, Douglas B ^a   Hummler, Klaus M ^a,b  

^a IBM MICROELECTRONICS   (United States)

^b Integrated Circuit Division   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 1542374383     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589508     Document Type: Article

References (5)

1. D. Kenney et al., 1992 Symposium on VLSI Technology, Digest of Technical Papers, June 1992, pp. 14 and 15.
2. G. Bronner et al., Proceedings of 1995 Symposium on VLSI Technology (IEEE, New York, 1995), pp. 15 and 16.
3. Keith C. Stevens and Thomas J. Wilson, Microelectron. Eng. 12, 397 (1990).
4. M. Macari et al., Proceedings of the Reliability Physics Symposium, 1982, pp. 163-165.
5. S. Roehl et al., Proceedings of the 9th International VLSI Multilevel Interconnection Conference, 1992, pp. 22-28.