Study on the strength and elongation of free-standing Al beams for microelectromechanical systems applications

Applied Physics Letters

Volumn 84, Issue 6, 2004, Pages 915-917

  Lee, Hoo Jeong ^a   Zhang, Ping ^b   Bravman, John C ^b  

^a Yale University   (United States)

^b Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; GRAIN SIZE AND SHAPE; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; OPTICAL MICROSCOPY; PIEZOELECTRIC DEVICES; SILICON NITRIDE; SILICON WAFERS; TEMPERATURE; YIELD STRESS;

ELONGATION; FOCUSED ION BEAM; FREE-STANDING BEAMS; HALL-PETCH COEFFICIENT; HALL-PETCH LINES; PIEZOELECTRIC ACTUATOR;

ALUMINUM BEAMS AND GIRDERS;

EID: 1542345309     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1646765     Document Type: Article

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