Synthesis and Cationic Photopolymerization of New Silicon-Containing Oxetane Monomers

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 42, Issue 6, 2004, Pages 1415-1420

  Sangermano, M ^a   Bongiovanni, R ^a   Malucelli, G ^a   Priola, A ^a   Olbrych, J ^b   Harden, A ^b   Rehnberg, N ^b  

^a POLITECNICO DI TORINO   (Italy)

^b Perstorp Specialty Chemicals ^*  (Sweden)

Author keywords

Cationic photopolymerization; Coatings; Differential scanning calorimetry (DSC); Oxetane monomers; Silicon monomers; Surface tension; Wettability

Indexed keywords

CATIONIC POLYMERIZATION; COATINGS; DIFFERENTIAL SCANNING CALORIMETRY; HYDROPHOBICITY; PHOTOPOLYMERIZATION; RESINS; SILICON; SURFACE TENSION; SYNTHESIS (CHEMICAL); WETTING;

OXETANE MONOMERS; SILICON MONOMERS; WETTABILITY;

MONOMERS;

MONOMER; SYNTHESIS;

EID: 1542335769     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/pola.20005     Document Type: Article

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