Fabrication Tolerance and Optimal Design of Spectral Sensitivities for Color Imaging Devices

Society for Imaging Science and Technology: Image Processing, Image Quality, Image Capture, Systems Conference

Volumn , Issue , 2001, Pages 277-282

  Quan, Shuxue ^a   Ohta, Noboru ^a   Rosen, Mitchell ^a   Katoh, Naoya ^b  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

^b SONY CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CALORIMETRY; COLOR MATCHING; ERROR ANALYSIS; IMAGE QUALITY; IMAGING SYSTEMS; MATHEMATICAL OPERATORS; MATRIX ALGEBRA; OPTICAL FILTERS; SENSITIVITY ANALYSIS;

COLOR DIFFERENCES; SPECTRAL SENSITIVITY FUNCTIONS;

COLOR IMAGE PROCESSING;

EID: 1542302691     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)

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