An ellipsometric study of the oxidation of thin copper films in oxygen

Inorganic Materials

Volumn 37, Issue 5, 2001, Pages 473-475

  Khoviv, A M ^a   Nazarenko, I N ^a   Churikov, A A ^a  

^a VORONEZH STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; OXYGEN;

ARTICLE; ELLIPSOMETRY; EVALUATION; FILM; ORGANIZATION; OXIDATION; OXIDATION KINETICS; THERMAL ANALYSIS;

EID: 1542301295     PISSN: 00201685     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1017524700274     Document Type: Article

References (10)

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2. Translated under the title Okislenie metallov i splavov, Moscow: Metallurgiya, 1965.
3. Wagner, G., Diffusion and High Temperature Oxidation of Metals, Cleveland: American Society for Metals, 1951.
4. Lenglet, M. and Kartouni, K., Characterization of the Initial Stages of Copper Oxidation by Optical Absorption and Photoluminescence, Rev. Metall. (Paris), 1993, vol. 90, no. 12, pp. 1638-1645.
5. Uryvskii, Yu.I., Lavrent'ev, K.A., Sedov, A.N., et al., A Setup with an Automatic Ellipsometer Built into the Specimen Chamber for Studying the Physicochemical Processes Underlying the Growth and Etching of Dielectric Layers on Solid Surfaces, in Sovreinennye problemy ellipsometrii (Current Topics in Ellipsometry), Novosibirsk, 1980, pp. 71-78.
6. Uryvskii, Yu.I., On the Simplification and Improvement of Ellipsometric Characterization of Dielectric Films, Elektron. Tekh., Ser: 8, 1972, no. 10, pp. 106-114.
7. Bunday, B.D., Basic Optimization Methods, London: Arnold, 1984.
8. Translated under the title Melody optimizatsii, Moscow: Radio i Svyaz', 1988, pp. 101-109.
9. Khoviv, A.M., Nazarenko, I.N., and Malevskaya, L.A., A Model for Thermal Oxidation of Silicon with Consideration for the Self-organization of the Interfacial Layer, Neorg. Mater., 1997, vol. 33, no. 11, pp. 1294-1297
10. [Inorg. Mater. (Engl. Transl.), vol. 33, no. 11, pp. 1095-1097].