Focused Ion Beam Analysis of Organic Low-k Dielectrics

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn , Issue , 2000, Pages 397-405

  Bender, H ^a   Donaton, R A ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CURRENT DENSITY; ETCHING; IMAGING SYSTEMS; ION BEAMS; ION IMPLANTATION; MULTILAYERS; SCANNING ELECTRON MICROSCOPY; SILICA; TRANSMISSION ELECTRON MICROSCOPY;

FOCUSED ION BEAM (FIB); ION MILLIMG;

DIELECTRIC MATERIALS;

EID: 1542300777     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

1. E.C.G. Kirk, D.A. Williams and H. Ahmed, Inst. Phys. Conf. Ser. 100, 501 (1989)
2. H. Bender, Inst. Phys. Conf. Ser 164, 593-602 (1999)
3. S. Hens, J. Van Landuyt, H. Bender, F. Lanckmans and K. Maex, Proceedings European Electron Microscopy Conference 2000, EUREM2000, Brno, July 2000, in press
4. T.J. Stark, G.M. Shedd, J. Vitarelli, D.P. Griffis and P.E. Russell, J. Vac. Sci. Technol. B 13, 2565-2569 (1995)
5. T.J. Stark, D.P. Griffis and P.E. Russell, J. Vac. Sci. Technol. B 14, 3990-3995 (1996)
6. R.J. Young, J.R.A. Cleaver and H. Ahmed, J. Vac. Sci. Technol. B 11, 234-241 (1993)
7. H. Bender, unpublished