Magnetoresistance behavior of single castellated Ni80Fe20 nanowires

Journal of Applied Physics

Volumn 95, Issue 4, 2004, Pages 2025-2028

  Adeyeye, A O ^a   White, R L ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRIC CONTACTS; ELECTRON BEAM LITHOGRAPHY; MAGNETIC ANISOTROPY; MAGNETIC FIELDS; MAGNETIC VARIABLES MEASUREMENT; MAGNETIZATION; MAGNETORESISTANCE; NICKEL ALLOYS; OPTICAL KERR EFFECT; SCANNING ELECTRON MICROSCOPY; TEMPERATURE;

ANISOTROPIC MAGNETORESISTANCE EFFECT; LORETZ MICROSCOPY; MAGNETORESISTANCE MEASUREMENT; MICROMAGNETIC SIMULATIONS; NANOWIRES;

NANOSTRUCTURED MATERIALS;

EID: 1542276682     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1637726     Document Type: Article

References (6)

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