Optimized DRIE Etching of Ultra-Small Quartz Resonators

Proceedings of the Annual IEEE International Frequency Control Symposium

Volumn , Issue , 2003, Pages 829-832

  Chang, David T ^a   Stratton, Frederic P ^a   Kubena, Randall L ^a   Joyce, Richard J ^a  

^a Hughes Aircraft Co   (United States)

Author keywords

DRIE; Quartz; Resonators

Indexed keywords

ELECTRIC FILTERS; ELECTRIC POTENTIAL; ELECTRODES; INDUCTIVELY COUPLED PLASMA; MASKS; MICROPROCESSOR CHIPS; PHOTORESISTS; QUARTZ; REACTIVE ION ETCHING; SILICON WAFERS; SINGLE CRYSTALS; SURFACE ROUGHNESS;

DEEP REACTIVE ION ETCHING (DRIE); ON-CHIP FILTERS;

RESONATORS;

EID: 1542275514     PISSN: 01616404     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)

1. C. T.-C. Nguyen, "RF MEMS for Wireless Applications," Device Research Conference, 9-12, 2002.
2. C. R. Tellier and F. Jouffroy, "Orientation Effects in Chemical Etching of Quartz Plates," J. Mater. Sci., 18, 3621-3632, 1983.
3. T. Abe, M. Esashi, "One-chip Multichannel Quartz Crystal Microbalance (QCM) Fabricated by Deep RIE," Sensors and Actuators 82 (2000) 139-143.