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Volumn 52, Issue 3, 2005, Pages 427-429

NAND-type DRAM-on-SGT

Author keywords

Gain cell; NAND type DRAM; Surrounding gate transistor (SGT)

Indexed keywords

CAPACITORS; ELECTRIC POTENTIAL; EQUIVALENT CIRCUITS; GATES (TRANSISTOR); LITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 15044362585     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2004.842717     Document Type: Article
Times cited : (6)

References (13)
  • 5
    • 0014868119 scopus 로고
    • "Three-transistor-cell 1024-bit 500 ns MOS RAM"
    • Oct
    • W. M. Regitz and J. A. Karp, "Three-transistor-cell 1024-bit 500 ns MOS RAM," IEEE J. Solid-State Circuits, vol. 5, no. 5, pp. 181-186, Oct. 1970.
    • (1970) IEEE J. Solid-State Circuits , vol.5 , Issue.5 , pp. 181-186
    • Regitz, W.M.1    Karp, J.A.2
  • 7
    • 3142539024 scopus 로고    scopus 로고
    • "New three-dimensional high-density stacked-surrounding gate transistor (S-SGT) flash memory architecture using self-aligned interconnection fabrication technology without photolithography process for tera-bits and beyond"
    • Apr
    • H. Sakuraba, K. Kinoshita, T. Tanigami, T. Yokoyama, S. Horii, M. Saitoh, K. Sakiyama, T. Endoh, and F. Masuoka, "New three-dimensional high-density stacked-surrounding gate transistor (S-SGT) flash memory architecture using self-aligned interconnection fabrication technology without photolithography process for tera-bits and beyond," Jpn J. Appl. Phys., vol. 43, pp. 2217-2219, Apr. 2004.
    • (2004) Jpn. J. Appl. Phys. , vol.43 , pp. 2217-2219
    • Sakuraba, H.1    Kinoshita, K.2    Tanigami, T.3    Yokoyama, T.4    Horii, S.5    Saitoh, M.6    Sakiyama, K.7    Endoh, T.8    Masuoka, F.9
  • 8
    • 0141974959 scopus 로고    scopus 로고
    • "Impact of three-dimensional transistor on the pattern area reduction for ULSI"
    • Oct
    • S. Watanabe, "Impact of three-dimensional transistor on the pattern area reduction for ULSI," IEEE Trans. Electron Devices, vol. 50, no. 10, pp. 2073-2080, Oct. 2003.
    • (2003) IEEE Trans. Electron. Devices , vol.50 , Issue.10 , pp. 2073-2080
    • Watanabe, S.1
  • 9
    • 0042026499 scopus 로고    scopus 로고
    • "Numerical analysis of alpha-particle-induced soft errors in floating channel type surrounding gate transistor (FC-SGT) DRAM cell"
    • Jul
    • F. Matsuoka and F. Masuoka, "Numerical analysis of alpha-particle-induced soft errors in floating channel type surrounding gate transistor (FC-SGT) DRAM cell," IEEE Trans. Electron Devices vol. 50, no. 7, pp. 1638-1644, Jul. 2003.
    • (2003) IEEE Trans. Electron. Devices , vol.50 , Issue.7 , pp. 1638-1644
    • Matsuoka, F.1    Masuoka, F.2
  • 10
    • 0023563047 scopus 로고
    • "New ultrahigh-density EPROM and flash EEPROM with NAND structure cell"
    • F. Masuoka, M. Momodomi, Y. Iwata, and R. Shirota, "New ultrahigh-density EPROM and flash EEPROM with NAND structure cell," in IEDM Tech. Dig., 1987, pp. 552-555.
    • (1987) IEDM Tech. Dig. , pp. 552-555
    • Masuoka, F.1    Momodomi, M.2    Iwata, Y.3    Shirota, R.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.