Properties of obliquely sputtered Co on different underlayers on polymer substrate

Journal of Magnetism and Magnetic Materials

Volumn 272-276, Issue III, 2004, Pages 2171-2172

  Nguyen, L T ^a   Lodder, J C ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Magnetic anisotropy; Oblique deposition; Polymer substrate; Thin film; Underlayer

Indexed keywords

DEPOSITION; MAGNETIC ANISOTROPY; METALLIC FILMS; MICROSTRUCTURE; POLYMERS; SPUTTERING; THIN FILMS;

FILM THICKNESS; OBLIQUE DEPOSITION; POLYMER SUBSTRATE; UNDERLAYERS;

COBALT;

EID: 15044355617     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2003.12.524     Document Type: Conference Paper

References (5)

1. K. Chiba, et al., IEEE Trans. Consumer Electron. 35 (1989) 421.
2. M.D. Bijker, et al., J. Magn. Magn. Mater. 193 (1999) 352.
3. L.T. Nguyen et al., in J. Appl. Phys. Submitted for publications.
4. S. van Dijken, et al., Appl. Phys. Lett. 77 (2000) 2030.
5. Y. Hsu, J.M. Siversten, J.H. Judy, IEEE Trans. Magn. 26 (1990) 1599