Fabrication of two-dimensional photonic structure of titanium dioxide with sub-micrometer resolution by deep x-ray lithography

Materials Research Society Symposium Proceedings

Volumn 820, Issue , 2004, Pages 295-300

  Awazu, Koichi ^a   Fujimaki, Makoto ^a   Wang, Xiaomin ^a   Sai, Akihide ^b   Ohki, Yoshimichi ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b WASEDA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; NANOSTRUCTURED MATERIALS; OPTICAL COMMUNICATION; REACTIVE ION ETCHING; REFRACTIVE INDEX; SEMICONDUCTOR MATERIALS; THERMAL EXPANSION; X RAY LITHOGRAPHY;

LIQUID PHASE DEPOSITION (LPD); MICRO-FABRICATION; PHOTONIC CRYSTALS (PHC); PHOTONIC STRUCTURES;

TITANIUM DIOXIDE;

REFRACTIVITY; SEMICONDUCTORS; THERMAL EXPANSION; TITANIUM DIOXIDE;

EID: 14944381806     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-820-r4.5     Document Type: Conference Paper

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