Electronic properties of thin Ni2MnIn Heusler films

Journal of Magnetism and Magnetic Materials

Volumn 290-291 PART 2, Issue , 2005, Pages 1371-1374

  Von Oehsen, S ^a   Scholtyssek, J M ^a   Pels, C ^a   Neuber, G ^a   Rauer, R ^a   Rubhausen M ^a   Meier, G ^a  

^a UNIVERSITY OF HAMBURG   (Germany)

Author keywords

Andreev reflection; Heusler alloys; Magneto optics; Spin polarization

Indexed keywords

ELECTRONIC PROPERTIES; ENERGY DISPERSIVE SPECTROSCOPY; FERMI LEVEL; FERROMAGNETISM; MAGNETOOPTICAL EFFECTS; MAGNETRON SPUTTERING; NICKEL COMPOUNDS; POLARIZATION; TRANSMISSION ELECTRON MICROSCOPY;

ANDREEV REFLECTION; CURIE TEMPERATURE; HEUSLER ALLOYS; SPIN POLARIZATION;

METALLIC FILMS;

EID: 14944375853     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2004.11.440     Document Type: Article

References (18)

1. F. Heusler, W. Starck, and E. Haupt Verh. Deutsch. Phys. Ges. 12 1903 220
2. P.J. Webster Contemp. Phys. 10 1969 559
3. R.A. de Groot, F.M. Mueller, P.G. van Engen, and K.H.J. Buschow Phys. Rev. Lett. 50 1983 2024
4. X.Y. Dong, J.W. Dong, J.Q. Xie, T.C. Shih, S. McKernan, C. Leighton, and C.J. Palmstrøm J. Crystal Growth 254 2003 384
5. W.E. Pickett, and J.S. Moodera Phys. Today 54 2001 39
6. P.J. Webster, K.R.A. Ziebeck, S.L. Town, and M.S. Peak Philos. Mag. B 49 1984 295
7. T. Matsuyama, R. Kürsten, C. Meißner, and U. Merkt Phys. Rev. B 61 2000 15588
8. V.V. Godlevsky, and K.M. Rabe Phys. Rev. B 63 2001 134407
9. M.D. Huang, N.N. Lee, B.J. Kim, Y.P. Lee, Y.V. Kudryatsev, IEEE Trans. Magn. (2004).
10. M. Kurfiß, F. Schultz, R. Anton, G. Meier, L.v. Sawilski, J. Kötzler, J. Magn. Magn. Mater. doi: 10.1016/j.jmmm.2004.11.272.
11. M. Kurfiß, and R. Anton J. Alloys Compounds 361 2003 36
12. K.A. Kilian, and R.H. Victora IEEE Trans. Magn. 37 2001 1976
13. R.J. Soulen Jr., J.M. Byers, M.S. Osofsky, B. Nadgorny, T. Ambrose, S.F. Cheng, P.R. Broussard, C.T. Tanaka, J. Nowak, J.S. Moodera, A. Barry, and J.M.D. Coey Science 282 1998 85
14. G. Neuber, R. Rauer, J. Kunze, T. Korn, C. Pels, G. Meier, U. Merkt, J. Bäckström, and M. Rübhausen Appl. Phys. Lett. 83 2003 4509
15. R. Rauer, G. Neuber, J. Kunze, J. Bäckström, M. Rübhausen, Rev. Sci. Instr. 76(1) (2005).
16. A.F. Andreev JETP 19 1964 1228
17. G.E. Blonder, M. Tinkham, and T.M. Klapwijk Phys. Rev. B 25 1982 4515
18. G.J. Strijkers, Y. Ji, F.Y. Yang, C.L. Chien, and J.M. Byers Phys. Rev. B 63 2001 104510