New type magnetoresistance in Co/Si systems

Journal of Magnetism and Magnetic Materials

Volumn 290-291 PART 2, Issue , 2005, Pages 1063-1066

  Honda, S ^a   Ishikawa, T ^a   Takai, K ^a   Mitarai, Y ^a   Harada, H ^a  

^a SHIMANE UNIVERSITY   (Japan)

Author keywords

Anodized Si; Co Si multilayer; Ordinary magnetoresistance

Indexed keywords

ANODIC OXIDATION; COBALT; CURVE FITTING; EVAPORATION; MAGNETORESISTANCE; SILICON; SPUTTER DEPOSITION;

ANODIZED SILICON; JUNCTION AREA; ORDINARY MAGNETORESISTANCE; SATURATION FIELDS;

MULTILAYERS;

EID: 14944356448     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2004.11.459     Document Type: Article

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