Design aspects for the fabrication of gratings for DFB-lasers by direct write electron-beam lithography

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 51-54

  Steingruber R ^a   Mohrle M ^a  

^a FRAUNHOFER HEINRICH HERTZ INSTITUTE   (Germany)

Author keywords

Direct write electron beam lithography; Gratings for DFB lasers

Indexed keywords

DISTRIBUTED FEEDBACK LASERS; ELECTRON BEAM LITHOGRAPHY; FABRICATION; OPTICAL FIBERS; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR MATERIALS; SIGNAL PROCESSING; WAVELENGTH DIVISION MULTIPLEXING;

DIRECT WRITE ELECTRON-BEAM LITHOGRAPHY; GRATINGS FOR DISTRIBUTED-FEEDBACK (DFB) LASERS; LINE/SPACE RATIO; SELF-PULSUATING DISTRIBUTED-FEEDBACK (DFB) LASERS;

DIFFRACTION GRATINGS;

EID: 14944343829     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.009     Document Type: Conference Paper

References (3)

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2. G. Han, M. Khan, Y. Fang, and F. Cerina J. Vac. Sci. Technol. 20 6 2002 2666 2671
3. M.A. McCord, and K.J. Rocks Handbook of microlithography, micromachining, and microfabrication vol. 1 1997 SPIE Press 0-8194-2378-5 205 206