Leaching behaviour of low - Activity alpha-doped UO2

Materials Research Society Symposium Proceedings

Volumn 824, Issue , 2004, Pages 167-173

  Rondinella, Vincenzo V ^a,b   Cobos, Joaquin ^a   Wiss, Thierry ^a  

^a JOINT RESEARCH CENTRE   (Italy)

^b CIEMAT   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); DOPING (ADDITIVES); ETCHING; LEACHING; RADIOLYSIS; SCANNING ELECTRON MICROSCOPY; SOLUTIONS; SPENT FUELS; TEMPERATURE DISTRIBUTION;

CARBONATED WATER (CW); DEAERATED CONDITIONS; DEIONIZED WATER; ROOM TEMPERATURES;

URANIUM DIOXIDE;

EID: 14944341605     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-824-cc9.8     Document Type: Conference Paper

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