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Volumn 34, Issue 2, 2005, Pages 312-315
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Formation of GaN film by ammoniating Ga2O3/Al2O3 deposited on Si(lll) substrate
a a a a a |
Author keywords
Ammoniating; Ga2O3 Al2O3 film; GaN; Magnetron sputtering
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Indexed keywords
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EID: 14844362621
PISSN: 1002185X
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (5)
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References (18)
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