RF plasma conditions for growth of carbon nanostructures

IEEE Transactions on Plasma Science

Volumn 33, Issue 1 II, 2005, Pages 170-175

  Collard, Corey ^a,b   Holloway, James Paul ^a   Brake, M L ^a,c  

^a UNIVERSITY OF MICHIGAN   (United States)

^b APPLIED MATERIALS INC   (United States)

^c EASTERN MICHIGAN UNIVERSITY   (United States)

Author keywords

Carbon based plasmas; Hydrogen actinometry; Nanotechnology; Plasmas; Rotational temperature; Spectroscopy

Indexed keywords

CARBON NANOTUBES; EMISSION SPECTROSCOPY; GROWTH (MATERIALS); MICROELECTRONICS; NANOTECHNOLOGY; PLASMAS; SILICON;

CARBON BASED PLASMAS; HYDROGEN ACTINOMETRY; ROTATIONAL TEMPERATURE;

INDUCTIVELY COUPLED PLASMA;

EID: 14844337901     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2004.841807     Document Type: Article

References (32)

1. M. A. Liberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing. New York: Wiley, 1994.
2. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, "Electrical characteristics and electron heating mechanisms of an inductively coupled argon discharge," Plasma Sources Sci. Technol., vol. 3, pp. 169-169, 1994.
3. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, "The electron-energy distribution function in a shielded argon radiofrequency inductive discharge," Plasma Sources Sci. Technol., vol. 4, pp. 332-332, 1995.
4. G. G. Lister and M. Cox, "Modeling of inductively coupled discharges with internal and external coils," Plasma Sources Sci. Technol., vol. 1, pp. 67-67, 1992.
5. R. B. Piejak, V. A. Godyak, and B. M. Alexandrovich, "A simple analysis of an inductive RF discharge," Plasma Sources Sci. Technol., vol. 1, pp. 179-179, 1992.
6. M. Endo, K. Takeuchi, S. Igarashi, K. Kobori, M. Shiraishi, and H. W. Kroto, "The production and structure of pyrolytic carbon nanotubes," J. Phys. Chem. Solids, vol. 54, pp. 1841-1841, 1993.
7. O. M. Kuttel, O. Groening, C. Emmenegger, and L. Schlapbach, "Electron field emission from phase pure nanotube films grown in a methane/ hydrogen plasma," Appl. Phys. Lett., vol. 73, no. 15, pp. 2113-2113, 1997.
8. L. Delzeit, I. McAninch, B. Cruden, and M. Meyyappan, "Plasma CVD of carbon nanotubes," in 54th Annu. GEC Conf., State College, PA, Oct. 9-12, 2001.
9. P. Hargis Jr et al., "The GEC reference cell: A defined parallel-plate RF-system for experimental and theoretical studies of plasma processing discharges," Rev. Sci. Instrum., vol. 65, no. 1, pp. 140-140, 1994.
10. The National Institute of Standards and Technology Radio Frequency Reference Cell Homepage. [Online]. Available: http://physics.nist.gov/ MajResProj/rfcell/RF_Cell.htm
11. P. A. Miller, G. A. Hebner, K. E. Greenberg, P. D. Pochan, and B. P. Aragon, "An inducively coupled plasma source for the gaseous electronics conference RF reference cell," J. Res. Natl. Inst. Stand. Technol., vol. 100, pp. 427-427, 1995.
12. X. Zhao, M. Ohkohchi, M. Wang, S. Iijima, T. Ichihashi, and Y. Ando, "Preparation of high-grade carbon nanotubes by hydrogen arc discharge," in Reports of the Faculty of Science and Technology. Nagoya, Japan: Meijo University, 1997, vol. 37, pp. 77-77.
13. 4 or He gas," Jpn. J. Appl. Phys., vol. 38, pp. 6014-6014, 1999.
14. M. D. Whitfield, J. S. Foord, J. A. Savage, and R. B. Jackman, "Characterization of the secondary glow region of a biased microwave plasma by optical emission spectroscopy," Diamond Relat. Mater., vol. 9, pp. 305-305, 2000.
15. S. Shannon, "Spatially Resolved Analysis of Plasma Etch Discharges Using a Novel Optical Emission Spectroscopy Sensor," Ph.D. dissertation, Dept. Nucl. Eng., Univ. Michigan, 1999.
16. S. Shannon, J. Holloway, K. Flippo, and M. Brake, "A spatially resolved optical emission sensor for plasma etch monitoring," Appl. Phys. Lett., vol. 71, no. 11, pp. 1467-1467, 1997.
17. J. P. Holloway, S. Shannon, S. M. Sepke, and M. L. Brake, "A reconstruction algorithm for a spatially resolved plasma optical emission spectroscopy sensor," J. Quant. Spectrosc. Radiat. Transf. vol. 68, no. 1, pp. 101-101, 2001.
18. A. G. Gaydon, The Spectroscopy of Flames. New York: Wiley, 1957.
19. R. W. B. Pearse and A. G. Gaydon, The Identification of Molecular Spectra. New York: Wiley, 1950.
20. J. Reader and C. H. Corliss, Wavelength and Transition Probabilities for Atoms and Atomic Ions. Washington, D.C.: U.S. Gov. Printing Office, 1980.
21. R. Saito, G. Dresselhaus, and M. S. Dresselhaus, Physical Properties of Carbon Nanotubes. London, U.K.: Imperial College Press, 1998.
22. C. Collard, "Spatially Resolved Analysis of Rare Gas and Carbon-Based Plasmas in RF Systems," Ph.D. dissertation, Dept. Nucl. Eng., Univ. Michigan, 2002.
23. 2 discharge during the growth of diamond," Phys. Rev. A, Gen. Phys., vol. 44, no. 6, pp. 3796-3796, 1991.
24. 2 discharge," J. Phys. D, Appl. Phys., vol. 29, pp. 1197-1197, 1996.
25. J. Laimer, F. Huber, G. Misslinger, and H. Stori, "Rotational Temperature Measurements in Hydrogen Discharges," Plasma Chem. Plasma Process., vol. 47, no. 2, pp. 183-183, 1996.
26. G. Herzberg, Molecular Spectra and Molecular Structure: I. Spectra of Diatomic Molecules. New York: D. Van Nostrand Co., Inc., 1950.
27. G. A. Hebner, "Spatially resolved, excited state densities and neutral and ion temperatures in inductively coupled argon plasmas," J. Appl. Phys., vol. 80, no. 5, pp. 2624-2624, 1996.
28. S. Song, M. Crimp, V. Ayres, C. Collard, J. Holloway, and M. Brake, "New hetero silicon-carbon nanostructures formation mechanism," J. Nanosci. Nanotech., vol. 4, pp. 817-817, 2004.
29. J. W. Coburn and M. Chen, "Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density," J. Appl. Phys., vol. 51, no. 6, pp. 3134-3134, 1980.
30. L. St-Onge and M. Moisan, "Hydrogen atom yield in RF and microwave hydrogen discharges," Plasma Chem. Plasma Process., vol. 14, no. 2, pp. 87-87, 1993.
31. B. Qi, R. M. Gilgenbach, Y. Y. Lau, M. D. Johnston, J. Lian, L. M. Wang, G. L. Doll, and A. Lazarides, "Abaltion plasma ion implantation experiments: Measurement of Fe implantation into Si," Appl. Phys. Lett., vol. 78, no. 24, pp. 3785-3785, 2001.
32. S. Turner, L. Kam, M. Isaacson, H. G. Craighead, W. Shain, and J. Turner, "Cell attachment on silicon nanostructures," J. Vac. Sci. Technol. B, Microelectron., vol. 15, no. 6, pp. 2848-2848, 1997.