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Volumn 404, Issue 4-6, 2005, Pages 327-335

Infrared spectroscopic identification of the methylsilylidyne (SiCH 3, X2A″) and the silenyl (H2CSiH, X 2A′) radicals in methane-silane matrices

(4) Bennett, Chris J a Sillars, David a Osamura, Yoshihiro b Kaiser, Ralf I a

a UNIVERSITY OF HAWAII (United States)

b RIKKYO UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; CHEMICAL VAPOR DEPOSITION; DEUTERIUM; INFRARED SPECTROSCOPY; IRRADIATION; ISOMERS; ORGANOMETALLICS; RADIOLYSIS; SILANES;

DEUTERATED MATRICES; ENERGETIC ELECTRONS; METHANE-SILANE MATRICES; METHYLSILYLIDYNE;

METHANE;

CARBON; HYDROGEN; METHANE; METHYL GROUP; RADICAL; SILANE;

ARTICLE; ELECTRON; ENERGY; INFRARED SPECTROSCOPY; IRRADIATION; ISOMER; RADIOLYSIS; SPECIES; TEMPERATURE; VAPOR;

EID: 14844316683 PISSN: 00092614 EISSN: None Source Type: Journal
DOI: 10.1016/j.cplett.2005.01.077 Document Type: Article

Times cited : (10)

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