Chemical reduction and wet etching of CeO2 thin films

Journal of the Electrochemical Society

Volumn 152, Issue 2, 2005, Pages

  Kossoy, A ^a   Greenberg, M ^a   Gartsman, K ^a   Lubomirsky, I ^a  

^a WEIZMANN INSTITUTE OF SCIENCE   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CERIUM COMPOUNDS; ETCHING; MIXTURES; MULTILAYERS; PLASMA APPLICATIONS; REDUCTION; SOLUTIONS; SPUTTERING; THIN FILMS;

CERIUM OXIDE; CHEMICAL REDUCTION; ULTRASONIC BATH; WET ETCHING;

METALLIC FILMS;

EID: 14744269254     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1850371     Document Type: Article

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