Influences of the aspect ratio and film thickness on switching properties of elliptical permalloy elements

IEEE Transactions on Magnetics

Volumn 41, Issue 2, 2005, Pages 947-949

  Chang, C C ^a   Chang, Y C ^a   Chung, W S ^a   Wu, J C ^a   Wei, Z H ^b   Lai, M F ^b   Chang, C R ^b  

^a NATIONAL CHANGHUA UNIVERSITY OF EDUCATION   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

Magnetic force microscopy (MFM); Magnetization switching; Magnetoresistance (MR); Permalloy; Single domain

Indexed keywords

ANISOTROPY; ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; MAGNETIC FIELD EFFECTS; MAGNETIZATION; MAGNETORESISTANCE; SCANNING ELECTRON MICROSCOPY; SWITCHING;

MAGNETIC FORCE MICROSCOPY (MFM); MAGNETIZATION SWITCHING; PERMALLOY; SINGLE-DOMAIN CONFIGURATION;

MAGNETIC FILMS;

EID: 14544306458     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2004.842131     Document Type: Article

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