Low temperature relaxation of residual stress in Ti-6Al-4V

Scripta Materialia

Volumn 52, Issue 10, 2005, Pages 1051-1056

  Elmer, J W ^a   Palmer, T A ^a   Babu, S S ^b   Specht, E D ^b  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Diffusion; Lattice parameters; Synchrotron radiation; Thermal activation; X ray diffraction

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CRYSTAL LATTICES; DIFFUSION; PARAMETER ESTIMATION; RELAXATION PROCESSES; RESIDUAL STRESSES; SYNCHROTRON RADIATION; X RAY DIFFRACTION;

ADVANCED PHOTON SOURCES (APS); ISOTHERMAL EXPERIMENTS; PHASE FRACTIONS; THERMAL ACTIVATION;

TITANIUM ALLOYS;

EID: 14544284114     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2005.01.021     Document Type: Article

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