An EPR study of two-electron sensitization by fragmentable donors

Final Program and Proceedings of IS and T's and SPSTJ's - AgX 2004: The International Symposium on Silver Halide Technology; At the Forefront of Silver Halide Imaging

Volumn , Issue , 2004, Pages 151-156

  Pawlik, T D ^a   Muenter, A A ^a   Eachus, R S ^a   Lenhard, J R ^a  

^a EASTMAN KODAK COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALS; ENERGY GAP; FREE RADICALS; PARAMAGNETIC RESONANCE; PHOTOGRAPHY; SENSITIVITY ANALYSIS;

CONDUCTION BANDS; ELECTRON INJECTION; HOLE CAPTURE; MOIETIES;

PHOTOCHEMICAL REACTIONS;

EID: 14544271879     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)

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3. S. Y. Farid, J. R. Lenhard, C. H. Chen, A. A. Muenter, I. R. Gould, S. A. Godleski, P. A. Zielinski, and C. H. Weidner, U.S. Patent 5,747,236, (1998).
4. S. Y. Farid, J. R. Lenhard, C. H. Chen, A. A. Muenter, I. R. Gould, S. A. Godleski, P. A. Zielinski, and C. H. Weidner U.S. Patent 5,994,051, (1999).
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8. R. S. Eachus, T. D. Pawlik, and R. C. Baetzold, J. Phys.: Condens. Matter 12, 8893 (2000).
9. T. Tani, Photographic Sensitivity: Theory and Mechanisms, Oxford University Press, New York, Chapter 6, 1995, pg. 185-186.
10. I. R. Could and S. Y. Farid, private communication
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