Novel approach to reducing stress-caused birefringence in polymers

Journal of Materials Science

Volumn 39, Issue 4, 2004, Pages 1415-1417

  Zhang, Zhiyi ^a   Liu, Iaren ^a   Xiao, Gaozhi ^a   Grover, C P ^a  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

BIREFRINGENCE; DIFFERENTIAL SCANNING CALORIMETRY; EPOXY RESINS; MOLECULAR ORIENTATION; ORGANIC COATINGS; PLASTIC FILMS; SHRINKAGE; SILICON WAFERS; SOL-GELS; STRESS RELAXATION; STRESSES; THERMAL EXPANSION;

COEFFICIENT OF THERMAL EXPANSION; DIPHENYLSILANEDIOL; GLYCIDYLLOXYPROPYLTRIMETHOXYSILANE; MISMATCHED THERMAL EXPANSION; STRESS SENSITIVITY;

ACRYLICS;

EID: 1442336042     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JMSC.0000013907.19650.f7     Document Type: Article

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