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Volumn , Issue , 2001, Pages 487-495

Process Features during the Plasmajet CVD Synthesis of Si-C-N Coatings

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COPPER ALLOYS; CORROSION PROTECTION; EMISSION SPECTROSCOPY; MORPHOLOGY; SILICON; THERMODYNAMICS; WEAR OF MATERIALS;

EID: 1442329020     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (19)
  • 3
    • 0026085939 scopus 로고
    • Evaluation of some mechanical properties of SiC films deposited on steel by plasma-assisted chemical vapour deposition from tetramethylsilane
    • M. Lelogais, M. Ducarroir, "Evaluation of some mechanical properties of SiC films deposited on steel by plasma-assisted chemical vapour deposition from tetramethylsilane", Surface and Coatings Technology, 48, (1991).
    • (1991) Surface and Coatings Technology , vol.48
    • Lelogais, M.1    Ducarroir, M.2
  • 4
    • 84953680275 scopus 로고
    • Intrinsic stress and mechanical properties of hydrogenated silicon carbide produced by plasma-enhanced chemical vapor deposition
    • H. Windischmann, "Intrinsic stress and mechanical properties of hydrogenated silicon carbide produced by plasma-enhanced chemical vapor deposition", Journal of Vacuum Science and Technology, A 9, 4, (1991).
    • (1991) Journal of Vacuum Science and Technology, A , vol.9 , pp. 4
    • Windischmann, H.1
  • 5
    • 0026791111 scopus 로고
    • Mechanical properties of thin ceramic coatings of the Si-C-N system deposited by reactive ion-plasma sputtering
    • N.V. Novikov, M.A. Voronkin, N.I. Zaika, "Mechanical properties of thin ceramic coatings of the Si-C-N system deposited by reactive ion-plasma sputtering", Diamond and Related Materials, 1 (1992).
    • (1992) Diamond and Related Materials , pp. 1
    • Novikov, N.V.1    Voronkin, M.A.2    Zaika, N.I.3
  • 12
    • 0033246023 scopus 로고    scopus 로고
    • Thermal Plasma Technology: Where Do We Stand and Where Are We Going?
    • E. Pfender, "Thermal Plasma Technology: Where Do We Stand and Where Are We Going?", Plasma Chemistry and Plasma Processing, 19, 1 (1999).
    • (1999) Plasma Chemistry and Plasma Processing , vol.19 , pp. 1
    • Pfender, E.1
  • 13
    • 0029514554 scopus 로고
    • Thermal Plasma Chemical Vapour Deposition of SiC
    • Y. Kojima, Y. Andoo, M. Doi, "Thermal Plasma Chemical Vapour Deposition of SiC", ISIJ International, 35, 11 (1995).
    • (1995) ISIJ International , vol.35 , pp. 11
    • Kojima, Y.1    Andoo, Y.2    Doi, M.3
  • 14
    • 1442273758 scopus 로고    scopus 로고
    • Use of liquid precursors for diamond chemical vapor deposition - The effects of mass transport and oxygen
    • August 2-6, Prague, Czech Republic
    • M. Asmann, K. Nelson, J. Heberlein, E. Pfender, "Use of liquid precursors for diamond chemical vapor deposition - the effects of mass transport and oxygen", 14th International Symposium on Plasma Chemistry, August 2-6, 1999, Prague, Czech Republic.
    • (1999) 14th International Symposium on Plasma Chemistry
    • Asmann, M.1    Nelson, K.2    Heberlein, J.3    Pfender, E.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.