Novel electrochemical process for the deposition of nanocrystalline NiFe2O4 thin films

Journal of Physics Condensed Matter

Volumn 16, Issue 6, 2004, Pages 773-784

  Sartale, S D ^a   Lokhande, C D ^b,d   Giersig, M ^a   Ganesan, V ^c  

^a HAHN MEITNER INSTITUT   (Germany)

^b SHIVAJI UNIVERSITY   (India)

^c Inter University Consortium   (India)

^d Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIZATION; BATH COMPOSITION; BATH TEMPERATURE; CRYSTALLINITY; NANOCRYSTALLINE;

COMPOSITION; CRYSTAL STRUCTURE; CURRENT DENSITY; ELECTRODEPOSITION; MORPHOLOGY; NANOSTRUCTURED MATERIALS; OPTIMIZATION; SUBSTRATES; SURFACES; TEMPERATURE; THIN FILMS;

NICKEL COMPOUNDS;

EID: 1442287064     PISSN: 09538984     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-8984/16/6/008     Document Type: Article

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