Precise profile control of 3D lateral junction traps by 2D mask layout and isotropic etching

Journal of Micromechanics and Microengineering

Volumn 15, Issue 2, 2005, Pages 386-393

  Yobas, Levent ^a   Sharma, Rajnish Kumar ^a   Nagarajan, Ranganathan ^a   Samper, Victor D ^a   Naidu, Priya Sarapna Rajoo ^a  

^a INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

BLOOD; CELLS; DEPOSITION; DNA; DOPING (ADDITIVES); FLUIDICS; HARMONIC ANALYSIS; MASKS; NUCLEIC ACIDS; OXIDATION; PLASMA ETCHING; SEMICONDUCTING SILICON; SOLUTIONS;

ISOTROPIC ETCHING; JUNCTION TRAPS; MICROFLUIDIC CHANNELS; THERMAL OXIDATION;

SEMICONDUCTOR JUNCTIONS;

EID: 14244258511     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/2/019     Document Type: Article

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