Growth of copper-phthalocyanine thin films on mica using a two-stage deposition technique

Applied Surface Science

Volumn 130-132, Issue , 1998, Pages 663-669

  Watanabe, Masanori ^a   Sano, Ken ichi ^a   Inoue, Morio ^a   Takagi, Toshinori ^a   Nakao, Toshinobu ^a   Yokota, Katsuhiro ^a   Takada, Jun ^a  

^a Ion Engineering Institute Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COPPER COMPOUNDS; CRYSTAL STRUCTURE; DEPOSITION; FILM GROWTH; MICA; ORGANOMETALLICS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ORGANIC COMPOUNDS; SURFACE ROUGHNESS; THIN FILMS; X RAY CRYSTALLOGRAPHY;

COPPER PHTHALOCYANINE; IONIZED CLUSTER BEAM (ICB); TWO STAGE DEPOSITION;

SEMICONDUCTING FILMS;

EID: 13844322213     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00135-4     Document Type: Article

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