Preparation of amorphous carbon nitride films from toluene and nitrogen by rf-PECVD

Materials Science and Technology

Volumn 20, Issue 9, 2004, Pages 1119-1122

  Aono, M ^a   Yamaguchi, K ^a   Kitazawa, N ^a   Watanabe, Y ^a  

^a NATIONAL DEFENSE ACADEMY   (Japan)

Author keywords

Amorphous; Carbon nitride; Plasma enhanced chemical vapour deposition (PECVD); Radio frequency; Structure

Indexed keywords

AMORPHOUS FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILICON; TOLUENE; VAPOR PRESSURE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

NITROGEN GAS PRESSURE; RADIO FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (RF-PECVD); TOLUENE VAPOR PRESSURE;

CARBON NITRIDE;

CARBON; CARBON NITRIDE; HYDROCARBON; HYDROGEN; NITROGEN; SILICON; TOLUENE; UNCLASSIFIED DRUG;

AMORPHOUS FILM; ARTICLE; FILM; INFRARED SPECTROSCOPY; PRESSURE; RADIOFREQUENCY; RADIOFREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROMETRY; STRUCTURE ANALYSIS; VAPOR PRESSURE; WET DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 13844319969     PISSN: 02670836     EISSN: None     Source Type: Journal    
DOI: 10.1179/026708304225019696     Document Type: Article

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