Extraordinary Hall effect in (Ni80Fe20) x(SiO2)1-x thin films

Physical Review B - Condensed Matter and Materials Physics

Volumn 70, Issue 22, 2004, Pages

  Liu, Hui ^a   Lee, Fuk Kay ^a   Zheng, Rong Kun ^a   Zhang, X X ^a   Tsui, Ophelia K C ^a  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

FERROMAGNETIC MATERIAL; IRON; NICKEL; SILICON DIOXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTRON; ENERGY; FILM; MAGNETIC FIELD; MAGNETISM; PHONON; TEMPERATURE; THICKNESS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 13844289489     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.70.224431     Document Type: Article

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