Application of the high-temperature Kelvin probe for in situ monitoring of the charge transfer at the oxygen/zirconia interface. Oxygen chemisorption isobar

Journal of Physics and Chemistry of Solids

Volumn 66, Issue 2-4, 2005, Pages 322-328

  Yamawaki, M ^a   Bak, T ^b   Nowotny, M K ^b   Nowotny, J ^b   Sorrell, C C ^b  

^a TOKAI UNIVERSITY   (Japan)

^b UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

Charge transfer; High temperature Kelvin probe; Oxygen zirconia interface; Surface sensitive electron probe; Work function; Zirconia

Indexed keywords

CHARGE TRANSFER; CHEMISORPTION; HIGH TEMPERATURE EFFECTS; IONIZATION; OXIDATION; OXYGEN; SURFACE CHEMISTRY; ZIRCONIA;

HIGH-TEMPERATURE KELVIN PROBE; OXYGEN-ZIRCONIA INTERFACE; SURFACE-SENSITIVE ELECTRON PROBE; WORK FUNCTION;

INTERFACES (MATERIALS);

EID: 13844278197     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2004.07.016     Document Type: Conference Paper

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